Effects of Substrate Bias on Low-Frequency Noise in Lateral Bipolar Transistors Fabricated on Silicon-on-Insulator Substrate

被引:7
|
作者
Hu, Qitao [1 ]
Chen, Si [1 ]
Zhang, Shi-Li [1 ]
Solomon, Paul [2 ]
Zhang, Zhen [1 ]
机构
[1] Uppsala Univ, Div Solid State Elect, Angstrom Lab, Dept Engn Sci, SE-75121 Uppsala, Sweden
[2] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
基金
瑞典研究理事会;
关键词
Lateral bipolar junction transistor; silicon nanowire field-effect transistor; biosensor; substrate bias; current amplification; trapping and detrapping; 1/f noise;
D O I
10.1109/LED.2019.2953362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter presents a systematic study of how the substrate bias (V-sub) modulation affects the current-voltage (I-V) characteristics and low-frequency noise (LFN) of lateral bipolar junction transistors (LBJTs) fabricatedon a silicon-on-insulator (SOI) substrate. The current gain (beta) of npn LBJTs at low base voltage can be greatly improved by a positiveVsub as a result of enhanced electron injection into the base near the buried oxide (BOX)/silicon interface. However, an excessive positive V-sub may also adversely affect the LFN performance by amplifying the noise generated as a result of carrier trapping and detrapping at that interface. Our results provide a practical guideline for improving both beta and the overall noise performance when using our LBJT as a local signal amplifier.
引用
收藏
页码:4 / 7
页数:4
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