Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon

被引：0

作者：

Motohiro, Tomoyoshi ^{[1
,2
]}

机构：

[1] Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

[2] Nagoya Univ, Inst Innovat Future Soc, Green Mobil Res Inst, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan

来源：

NANOSTRUCTURED THIN FILMS XI | 2018年 / 10731卷

关键词：

self-shadowing effect; oblique deposition; porous silicon; birefringence; visible photoluminescence; nanostructured thin film; diffusion limited aggregation; thin film retardation plate;

D O I：

10.1117/12.2322702

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Self-shadowing effect is elucidated as a simple means without "nanotechnology" to realize nanostructured thin films and layers in two typical prominent nanostructure effects, that is, birefringence of obliquely deposited thin films and intense visible photoluminescence of porous Si. In oblique deposition, the self-shadowing effect takes place in ballistic deposition and accumulation of materials on a vacuum / substrate interface. In porous Si, the drift diffusion of positive holes from an anode thorough Si to Si/HF solution interface causes a modified diffusion limited aggregation of positive holes which leads directly to formation of pores.

引用

页数：13