Diffusion in binary GeO2-SiO2 glasses

被引：0

作者：

Kirchhof, Johannes ^{[1
]}

Unger, Sonja ^{[1
]}

Knappe, Bruno ^{[1
]}

Dellith, Jan ^{[1
]}

机构：

[1] Inst Phys Hochtechnol EV Jena, D-07702 Jena, Germany

来源：

PHYSICS AND CHEMISTRY OF GLASSES-EUROPEAN JOURNAL OF GLASS SCIENCE AND TECHNOLOGY PART B | 2007年 / 48卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The diffusion of germanium in GeO2-SiO2 glasses with up to 18 mol% GeO, has been investigated by annealing of doped layers on the inner surface of quartz glass tubes between 1700 degrees C and 2000 degrees C in I bar oxygen atmosphere and measuring radial concentration profiles by x-ray microprobe analysis, subsequent to the tube collapse. By comparison with calculated profiles, diffusion coefficients could be deter),mined and fitted by all Arrhenius function, where the preexponential D-0=10(3.63) cm(2s-1), is CouStant but the activation energy decreases slightly with increasing coil cell tration c mol% GeO2) according to E=(590-1.4c) kJ mol(-1).

引用

页码：129 / 133

页数：5

共 50 条

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