Photoluminescent properties of ZnO films deposited on Si substrates

被引:0
|
作者
Zhang, GB
Shi, CS
Han, ZF
Shi, JY
Fu, ZX
Kirm, M
Zimmerer, G
机构
[1] Univ Sci & Technol China, Dept Phys, Hefei 230026, Peoples R China
[2] Univ Hamburg, Inst Expt Phys 2, D-2000 Hamburg, Germany
关键词
D O I
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The photoluminescence of ZnO films deposited on Si substrates by reactive de sputtering has been studied by using a synchrotron radiation (SR) light source. The excitation spectra show a strong excitation band around 195nm related to the 390nm emission band. Under SR vacuum ultraviolet excitation, a new emission band peaked at 290nm was found for the first time, besides the ultraviolet emission band (390nm) and green band (520 nm).
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页码:441 / 442
页数:2
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