Hard Carbon Films Synthesized By Atmospheric Pressure Filamentary Dielectric Barrier Discharge

被引：0

作者：

Suzuki, Tetsuya ^{[1
]}

Shirakura, Akira ^{[1
]}

机构：

[1] Keio Univ, Dept Mech Engn, Kohoku Ku, 3-14-1 Hiyoshi, Yokohama, Kanagawa 2238522, Japan

来源：

MACROMOLECULAR SYMPOSIA | 2018年 / 382卷 / 01期

关键词：

amorphous; atmospheric pressure; carbon; hardness; plasma CVD; DIAMOND-LIKE CARBON; HYDROGENATED AMORPHOUS-CARBON; CHEMICAL-VAPOR-DEPOSITION; GLOW PLASMA; TEMPERATURE;

D O I：

10.1002/masy.201800084

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

To synthesize hydrogenated amorphous carbon (a-C:H) films, filamentary dielectric discharge (FDBD) is used to improve their mechanical properties compared to the films synthesized by glow dielectric barrier discharge (GDBD), which is generally used for atmospheric pressure-plasma-enhanced chemical vapor deposition. The discharge form transitioned from GDBD to FDBD when the gap between the electrodes is increased from 1 to 4 mm. The hardness of the films increased from 3.7 to 11.9 GPa by using FDBD. The results indicate that hard a-C:H films can be synthesized at room temperature by atmospheric pressure using FDBD.

引用

页数：4

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