Macrodistribution of anodic dissolution rate at a rotating disk electrode with partially insulated surface

Macrodistribution of etching rates of a macroscopically nonuniform, partially "dipped," rotating disk electrode of low-carbon steel in 1 M NaCl at pH 1 with photoresist insulation and the density of active rectangular holes being similar to1.6 holes/mm(2) is studied at dimensionless etching rates i(avg)(0)/i(l) = 0.2-1.1, where i(avg)(0) is the average current density per active surface and i(l) the limiting anodic current density determined by the ionic transport rate. The distribution of the average etching rates in the normal direction is determined by the primary current distribution and is insensitive towards the type of the dissolution rate distribution in a cavity.