Structural and electrical properties of BiFeO3 thin films

被引:12
|
作者
Singh, SK
Funakuba, H
Uchida, H
Ishiwara, H
机构
[1] Tokyo Inst Technol, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Sophia Univ, Dept Chem, Chiyoda Ku, Tokyo 1028554, Japan
关键词
multiferroic; BiFeO3 thin films; sol-gel solution; leakage current density;
D O I
10.1080/10584580500413855
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
BiFeO 3 (BFO) thin films were fabricated by depositing sol-gel solutions on Pt/Ti/SiO 2 /Si (100) structures. The crystalline BFO phase was observed after 5-min- and 15-min-annealing for films formed using stoichemistric and 5% Bi-excess sol-gel solutions, respectively. Only Bi 2 Fe 4 O 9 were observed as the secondary phase during deposition and the fraction of secondary phase depended upon the annealing temperature as well as the annealing atmosphere. The leakage current density in the range of 10 -7 A/cm 2 was obtained after optimizing process conditions for stoichemistric BFO chemical solution. The remanent polarization of around 40 mu C/cm 2 was observed at 600 kV/cm applied field at room temperature, although the hysteresis loop was degraded by leakage current.
引用
收藏
页码:139 / 146
页数:8
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