Growth of CuInS2 epitaxial films on Si(001) by multisource evaporation method

被引:7
|
作者
Kobayashi, S
Kozakai, H
Vequizo, RM
Tsuboi, N
Oishi, K
Kaneko, F
机构
[1] Niigata Univ, Fac Engn, Niigata 9502181, Japan
[2] Niigata Univ, Grad Sch Sci & Technol, Niigata 9502181, Japan
[3] Niigata Univ, Ctr Transdisciplinary Res, Niigata 9502181, Japan
[4] Nagaoka Natl Coll Technol, Nagaoka, Niigata 9408532, Japan
关键词
CuInS2; vapor phase epitaxy; thin films; X-ray diffraction; reflection high energy electron diffraction; ternary compound; Cu-Au structure; chalcopyrite structure; photoluminescence;
D O I
10.1143/JJAP.44.999
中图分类号
O59 [应用物理学];
学科分类号
摘要
CuInS2 thin films were epitaxially grown on Si(001) wafers at 500 degrees C using multisource evaporation method. The Cu source temperature was varied keeping the In and S Source temperatures constant. The obtained films belonged to the Cu2S-ln(2)S(3) system with little extra phase over the range of 0.9 <= [Cu]/[In] <= 2.9. X-ray diffraction and reflection high energy electron diffraction measurements showed that the films were composed of Cu-Au, sphalerite and chalcopyrite structures, although the last was not always observed. The characteristic structures in the photoluminescence spectrum of a film with [Cu]/[In] = 1.4 measured at 23 K was interpreted as the weak broad exciton emission and the donor-acceptor pair emission with a phonon replica comparing to the bulk crystals. The position and the broadening of the exciton emission are reasonable considering the coexistence of various crystal structures.
引用
收藏
页码:999 / 1003
页数:5
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