Improved internal quantum efficiency of green emitting InGaN/GaN multiple quantum wells by in preflow for InGaN well growth

被引：23

作者：

Kumar, Muthusamy Senthil ^{[1
]}

Park, Jae Young

Lee, Yong Seok

Chung, Sang Jo

Hong, Chang-Hee

Suh, Eun-Kyung

机构：

[1] Chonbuk Natl Univ, Semicond Phys Res Ctr, Chonju 561756, South Korea

[2] Chonbuk Natl Univ, Sch Semicond & Chem Engn, Chonju 561756, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2008年 / 47卷 / 02期

关键词：

MOCVD; InGaN/GaN MQWs; surface pit; photoluminescence; internal quantum efficiency;

D O I：

10.1143/JJAP.47.839

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A series of green emitting In1-xGaxN/GaN multi-quantum wells (MQWs) has been grown by using low pressure metal organic chemical vapor deposition. Effects of In flow prior to InGaN well growth for a short duration on structural and optical properties of the MQWs have been studied. In pre-flow does not affect the structural properties such as In composition and interface abruptness of the InGaN/GaN MQW structure. But, it red shifts the photoluminescence (PL) emission peak of MQWs with increase of In pre-flow duration. For specific emission energy, the surface pit density of MQWs grown with In pre-flow is significantly lower than that of MQWs grown without In pre-flow. In pre-flow samples show about 30% enhancement of PL internal quantum efficiency in deep green region (>530nm) compared to MQWs grown without In pre-flow.

引用

页码：839 / 842

页数：4

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