Microgalvanics: Locally resolved concentration measurements with ion-selective microelectrodes and chronoamperometric microelectrodes

被引：0
|
作者：
Kupper, M
Schultze, JW
机构：
[1] Institut fur Physikalische-Chemie, und Elektrochemie II an der, Heinrich-Heine-Universitat, 40225 Dusseldorf, Germany
来源：
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1996年 / 356卷 / 3-4期
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D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Localized electrochemical analysis in the micrometer-range is useful for the in situ investigation of galvanic plating processes. Two techniques are presented, a potentiometric and a chronoamperometric one, using xyz-positionable microelectrodes for practical concentration measurements in microstructures during cathodic metal deposition. Locally measured concentration data c(xy) are related to local current density i(xy), which is not obtainable by other means in a system containing excess supporting electrolyte.
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页码：187 / 191
页数：5
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