Comparison of tool feed influence in CNC polishing between a novel circular-random path and other pseudo-random paths

被引：34

作者：

Takizawa, Ken ^{[1
]}

Beaucamp, Anthony ^{[1
]}

机构：

[1] Kyoto Univ, Nishikyo Ku, Katsura Campus C3,b2S04, Kyoto 6158540, Japan

来源：

OPTICS EXPRESS | 2017年 / 25卷 / 19期

基金：

日本学术振兴会;

关键词：

OPTIMIZATION; REMOVAL;

D O I：

10.1364/OE.25.022411

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography. (C) 2017 Optical Society of America

引用

页码：22411 / 22424

页数：14

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