The role of dissociative attachment from Rydberg states in enhancing H- concentration in moderate- and low-pressure H2 plasma sources

被引：58
|
作者：
Hassouni, K
Gicquel, A
Capitelli, M [1 ]
机构：
[1] Univ Bari, Dept Chem, CNR, Ctr Studio Chim Plasmi, Bari, Italy
[2] Univ Paris 13, CNRS, LIMHP, Villetaneuse, France
来源：
CHEMICAL PHYSICS LETTERS | 1998年 / 290卷 / 4-6期
关键词：
D O I：
10.1016/S0009-2614(98)00562-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A numerical code, recently developed for describing the kinetics of H-2 microwave discharges obtained in diamond deposition plasma reactors, was used to estimate the importance of dissociative attachment from H-2 Rydberg states in enhancing the production of H- in this kind of discharge. It was also used to investigate H- production in multicusp low-pressure magnetic plasmas. Results show that the dissociative attachment from Rydberg states can be as important as the mechanism involving vibrationally excited molecules in both types of plasmas. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码：502 / 508
页数：7
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