Development of a compact nitrogen radical source by helicon-wave discharge employing a permanent magnet

被引：20

作者：

Sasaki, K ^{[1
]}

Kokubu, H ^{[1
]}

Hayashi, D ^{[1
]}

Kadota, K ^{[1
]}

机构：

[1] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648603, Japan

来源：

THIN SOLID FILMS | 2001年 / 386卷 / 02期

关键词：

nitrogen radical source; helicon-wave; permanent magnet; high degree of dissociation;

D O I：

10.1016/S0040-6090(00)01650-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed a nitrogen radical source excited by helicon-wave discharge in Nz gas. The major features of the present radical source are: (1) high electron and radical densities; (2) low operational gas pressure below 1 mtorr; and (3) compactness by employing a permanent magnet. This radical source has potential applications in production of various nitride films such as GaN and beta -C3N4. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：243 / 247

页数：5

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