Dynamics of silicon plume generated by laser ablation and its chemical reaction

被引：15
|
作者：
Makimura, T
Murakami, K
机构：
[1] Institute of Materials Science, University of Tsukuba, Tsukuba
来源：
APPLIED SURFACE SCIENCE | 1996年 / 96-8卷
关键词：
D O I：
10.1016/0169-4332(95)00428-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make dear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial distribution of light emission from the laser-ablated particles as well as time- and space-resolved emission spectra.
引用
收藏
页码：242 / 250
页数：9
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