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- [5] LOW-TEMPERATURE SILICON EPITAXIAL-GROWTH BY CO2-LASER CVD USING SIH4 GAS JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (04): : 524 - 527
- [6] Properties of silicon-oxygen alloy films prepared from SiH4 + CO2 gas mixture Haga, Koichi, 1600, (30):
- [7] AMPLIFICATION DUE TO THE LASER TRANSITION IN CO2 MOLECULES EXCITED IN THE COURSE OF THE CHAIN-REACTION OF THE SIH4 CHLORINATION KVANTOVAYA ELEKTRONIKA, 1985, 12 (08): : 1574 - 1581
- [8] Characteristics of Silicon Nanoparticles Depending on H-2 Gas Flow During Nanoparticle Synthesis via CO2 Laser Pyrolysis KOREAN JOURNAL OF MATERIALS RESEARCH, 2013, 23 (05): : 260 - 265