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Photoconductivity decay in metamorphic InAsP/InGaAs double heterostructures grown on InAsyP1-y compositionally step-graded buffers -: art. no. 071908
被引:4
|作者:
Lin, Y
Hudait, MK
Johnston, SW
Ahrenkiel, RK
Ringel, SA
[1
]
机构:
[1] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[2] Natl Renewable Energy Lab, Golden, CO 80401 USA
基金:
美国国家科学基金会;
关键词:
D O I:
10.1063/1.1866645
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Lattice-mismatched InAs0.32P0.68/In0.68Ga0.32As/InAS(0.32)P(0.68) double heterostructures (DH) were grown on compositionally graded InAsyP1-y/In substrates by solid-source molecular-beam epitaxy (MBE) out to a misfit of similar to 1%. The kinetics of carrier recombination were investigated in the nearly totally relaxed MBE-grown DH structures using photoconductivity decay (PCD) measurements. High minority carrier lifetimes of 4-5 mus. close to the radiation limit were measured, indicating the ability of MBE-grown InAsyP1-y buffers in achieving high-electronic-quality, low-band-gap mismatched InGaAs layers. Analysis suggests that very low interface recombination velocities are achieved. A photogenerated carrier diffusion model is presented to explain the initial nonlinear decays observed in PCD data for these heterostructures. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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