Double-barrier Josephson junctions: Theory and experiment

被引:10
|
作者
Brinkman, A
Cassel, D
Golubov, AA
Kupriyanov, MY
Siegel, M
Rogalla, H
机构
[1] Univ Twente, Dept Appl Phys, NL-7500 AE Enschede, Netherlands
[2] Moscow State Univ, Moscow, Russia
[3] Forschungszentrum Juelich GmbH, Inst Schicht & Ionentech, Julich, Germany
关键词
double-barrier; Josephson structures; non-stationary properties;
D O I
10.1109/77.919551
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
New theoretical and experimental results on double-barrier SIS'IS Josephson junctions are presented (I is a tunnel barrier, S' is a thin film with critical temperature lower than that of S), The previously developed microscopic model for the stationary case, which describes the critical currents in Nb/Al/Nb junctions, is extended to the non-equilibrium regime of finite voltage. In particular, an intrinsic shunting resistance is estimated from I-V curves. We formulate the requirements for interface barriers in order to realize non-hysteretic SIS'IS junctions with high critical current density and IcRN products. A comparison with single-barrier SIS junctions with high critical current density is carried out.
引用
收藏
页码:1146 / 1149
页数:4
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