Biaxially Textured Al Film Growth on CaF2 Nanostructures toward a Method of Preparing Single-Crystalline Si Film on Glass Substrates

被引:10
|
作者
Li, Huafang [1 ]
Snow, Patrick
He, Ming
Wang, Pei-I
Wang, Gwo-Ching
Lu, Toh-Ming
机构
[1] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
关键词
nanoepitaxy; silicon technology; oblique angle deposition; solid phase transformation; physical vapor deposition; transmission electron microscopy; ALUMINUM-INDUCED CRYSTALLIZATION; BEAM-ASSISTED DEPOSITION; THIN-FILMS; COATED CONDUCTORS; AMORPHOUS-SILICON; EPITAXIAL-GROWTH; TEMPLATE FILMS; CU FILMS; MGO;
D O I
10.1021/nn1011978
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report the room temperature growth of biaxially textured Al films and further demonstrate the use of these Al films in preparing single-crystalline Si layers on glass substrates. The formation of the biaxial texture in Al film relies on the existence of the CaF2 buffer layer prepared using oblique angle physical vapor deposition, which consists of single-crystalline nanorods with caps that are in the form of inverted nanopyramids. The single-crystalline Si film was obtained upon crystallization of the amorphous Si film deposited through physical evaporation on the biaxially textured Al film. This method of preparing single-crystalline Si film on glass substrate is potentially attractive for being employed in silicon technology and in fabrication of low-cost electronic devices.
引用
收藏
页码:5627 / 5632
页数:6
相关论文
共 49 条
  • [1] Biaxially-textured photovoltaic film crystal silicon on ion beam assisted deposition CaF2 seed layers on glass
    Groves, James R.
    Li, Joel B.
    Clemens, Bruce M.
    LaSalvia, Vincenzo
    Hasoon, Falah
    Branz, Howard M.
    Teplin, Charles W.
    ENERGY & ENVIRONMENTAL SCIENCE, 2012, 5 (05) : 6905 - 6908
  • [2] GROWTH AND ELECTRICAL-PROPERTIES OF SINGLE CRYSTALLINE SI/CAF2/SI HETEROEPITAXIAL STRUCTURES
    ASANO, T
    ISHIWARA, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C320 - C320
  • [3] Studies of preparing method of nano grain metal-insulator film Cu:CaF2
    Zhao, Zi-Qiang
    Wei, Lun-Cun
    Wang, Hao
    Zhong, Yun-Cheng
    Lu, Xi-Ting
    1996, Science Press, Beijing, China (07):
  • [4] Studies of preparing method of nano grain metal-insulator film Cu:CaF2
    赵子强
    韦伦存
    王浩
    钟运成
    卢希庭
    Nuclear Science and Techniques, 1996, (04) : 240 - 242
  • [5] Reduction of electrical resistance of nanometer-thick CoSi2 film on CaF2 by pseudomorphic growth of CaF2 on Si(111)
    Saitoh, W
    Mori, K
    Sugiura, H
    Maruyama, T
    Watanabe, M
    Asada, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7A): : 4470 - 4471
  • [6] Growth of epitaxial Y2O3 film on biaxially textured Ni-W substrates
    Bhuiyan, MS
    Paranthaman, M
    Sathyamurthy, S
    Aytug, T
    Kang, S
    Lee, DF
    Goyal, A
    Payzant, EA
    Salama, K
    FRONTIERS IN SUPERCONDUCTING MATERIALS-NEW MATERIALS AND APPLICATIONS, 2004, 3 : 57 - 59
  • [7] Low temperature μc-Si film growth using a CaF2 seed layer
    Kim, DY
    Ahn, BJ
    Moon, SI
    Won, CY
    Yi, J
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2002, 70 (04) : 415 - 423
  • [8] Continuous Single-Crystalline GaN Film Grown on WS2-Glass Wafer
    Yin, Yue
    Liu, Bingyao
    Chen, Qi
    Chen, Zhaolong
    Ren, Fang
    Zhang, Shuo
    Liu, Zhetong
    Wang, Rong
    Liang, Meng
    Yan, Jianchang
    Sun, Jingyu
    Yi, Xiaoyan
    Wei, Tongbo
    Wang, Junxi
    Li, Jinmin
    Liu, Zhongfan
    Gao, Peng
    Liu, Zhiqiang
    SMALL, 2022, 18 (41)
  • [9] Visible electroluminescence from nanocrystalline silicon embedded in single-crystalline CaF2/Si(111) with rapid thermal anneal
    Maruyama, Takeo
    Nakamura, Naoto
    Watanabe, Masahiro
    Japanese Journal of Applied Physics, Part 2: Letters, 1999, 38 (8 B):
  • [10] Visible electroluminescence from nanocrystalline silicon embedded in single-crystalline CaF2/Si(111) with rapid thermal anneal
    Maruyama, T
    Nakamura, N
    Watanabe, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (8B): : L904 - L906