Deposition and optical properties investigations of WO3 thin films for electrochromic device applications

被引：0
|
作者：
Rybak, Janusz [1 ]
Marszalek, Konstanty [1 ]
机构：
[1] AGH Univ Sci & Technol, Elect Inst, 30 Mickiewicza Ave, PL-30059 Krakow, Poland
来源：
PRZEGLAD ELEKTROTECHNICZNY | 2022年 / 98卷 / 09期
关键词：
electrochromism; tungsten oxide thin films; magnetron sputtering; optical properties;
D O I：
10.15199/48.2022.09.59
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Tungsten oxide WO3 thin films are one of the most widely used layers with electrochromic properties. Various deposition methods are used to produce them, including magnetron sputtering. In this paper the authors present the construction of a Lesker high vacuum system for GLAD Magnetron Sputtering and results of optical properties investigations of WO3 thin films which can be used for multilayer electrochromic systems.
引用
收藏
页码：251 / 254
页数：4
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