All-reflective optical system design for extreme ultraviolet lithography

被引：7
|
作者：
Chang, Jun [1 ]
Zou, Meifang [1 ]
Wang, Ruirui [1 ]
Feng, Shulong [2 ]
Talha, M. M. [3 ]
机构：
[1] Beijing Inst Technol, Lab Optoelect Technol & Informat Syst, Sch Optoelect, Beijing 100081, Peoples R China
[2] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Changchun 343100, Peoples R China
[3] IICS, Islamaabad, Pakistan
来源：
CHINESE OPTICS LETTERS | 2010年 / 8卷 / 11期
关键词：
D O I：
10.3788/COL20100811.1082
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.
引用
收藏
页码：1082 / 1084
页数：3
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