Microstructure of phosphorus ion-implanted TiNi alloy

被引:0
|
作者
Zhao, XK [1 ]
Gao, ZY
Cai, W
Zhao, LC
机构
[1] Harbin Inst Technol, Harbin 150001, Peoples R China
[2] Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
关键词
D O I
10.1007/s10853-005-4352-y
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructures of phosphorus ion-implanted TiNi alloys were investigated. Specimens were cut from cold-rolled plates. These microstructures were studied with transmission electron microscopy (TEM) and high-resolution electron microscopy (HREM) techniques. Phase constitution was studied using small gazing incidence angle X-ray diffraction (GAXRD) method. Martensite and amorphous phases were formed in succession as phosphorus ion implanting does increasing from 1017 to 1018 P/cm2. The results show that annealing at a temperature above 773 K can mitigate the PII treatment effect and recover the microstructure.
引用
下载
收藏
页码:5291 / 5293
页数:3
相关论文
共 50 条
  • [1] Microstructure of phosphorus ion-implanted TiNi alloy
    Zhao Xingke
    Gao Zhiyong
    Cai Wei
    Zhao Liancheng
    Journal of Materials Science, 2005, 40 : 5291 - 5293
  • [2] Microstructure of ion-implanted region in TiNi alloy
    Ikenaga, Noriaki
    Kishi, Yoichi
    Yajima, Zenjiro
    Sakudo, Noriyuki
    Nakano, Shizuka
    Ogiso, Hisato
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (8-9): : 1509 - 1513
  • [3] Microstructure and hemocompatibility of a phosphorus ion-implanted TiNi shape-memory alloy
    Zhao, XK
    Cai, W
    Tian, Y
    Zhao, LC
    SHAPE MEMORY MATERIALS AND ITS APPLICATIONS, 2001, 394-3 : 153 - 156
  • [4] Surface morphology and plastic deformation of the ion-implanted TiNi alloy
    Meisner, LL
    Sivokha, VP
    Lotkov, AI
    Derevyagina, LA
    PHYSICA B-CONDENSED MATTER, 2001, 307 (1-4) : 251 - 257
  • [5] Micro-analysis of N+ ion-implanted TiNi shape memory alloy
    Feng, Xiangdong
    Wang, Zhiguo
    Zu, Xiaotao
    Dai, Jinyi
    Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2003, 32 (04): : 309 - 312
  • [6] Micro-analysis of N+ ion-implanted TiNi shape memory alloy
    Feng, XD
    Wang, ZG
    Zu, XT
    Dai, JY
    RARE METAL MATERIALS AND ENGINEERING, 2003, 32 (04) : 309 - 312
  • [7] DIFFUSION OF ION-IMPLANTED PHOSPHORUS IN SILICON
    CHELYADINSKII, AR
    TAHER, HIH
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1994, 142 (02): : 331 - 338
  • [8] Study of corrosion behavior and haemocompatibility of ion-implanted TiNi shape memory alloy and cobalt alloys
    Guo, Hai-Xia
    Liang, Cheng-Hao
    Mu, Zong-Xin
    Dalian Ligong Daxue Xuebao/Journal of Dalian University of Technology, 2002, 42 (03): : 301 - 305
  • [9] CHANNELING AND DECHANNELING OF ION-IMPLANTED PHOSPHORUS IN SILICON
    REDDI, VGK
    SANSBURY, JD
    JOURNAL OF APPLIED PHYSICS, 1973, 44 (07) : 2951 - 2963
  • [10] ASYMMETRICAL PROFILES OF ION-IMPLANTED PHOSPHORUS IN SILICON
    INOUE, K
    HIRAO, T
    YAEGASHI, Y
    TAKAYANAGI, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (02) : 367 - 372