Double-pulse irradiation by laser-induced plasma-assisted ablation (LIPAA) and mechanisms study

被引：43
|
作者：
Hanada, Y
Sugioka, K
Miyamoto, I
Midorikawa, K
机构：
[1] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
[2] Sci Univ Tokyo, Fac Ind Sci & Technol, Dept Appl Elect, Noda, Chiba 2788510, Japan
来源：
APPLIED SURFACE SCIENCE | 2005年 / 248卷 / 1-4期
关键词：
laser-induced plasma-assisted ablation (LIPAA); femtosecond laser; double-pulse irradiation;
D O I：
10.1016/j.apsusc.2005.03.050
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Double-pulse irradiation using a near-IR femtosecond laser (lambda = 775 nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distances was investigated. The first pulse generates the laser-induced plasma from the metal target, but does not induce ablation of the glass substrate. The second pulse induces the high-efficiency ablation of the substrate, delayed by several nanoseconds (ns). A possible mechanism of the conventional LIPAA process using a ns pulsed laser is discussed based on the obtained results. (c) 2005 Elsevier B.V. All fights reserved.
引用
收藏
页码：276 / 280
页数：5
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