Effect of bandgap engineering on thermal characteristic of radio frequency power SiGe heterojunction bipolar transistor

被引:4
|
作者
Xiao Ying [1 ]
Zhang Wan-Rong [1 ]
Jin Dong-Yue [1 ]
Chen Liang [1 ]
Wang Ren-Qing [1 ]
Xie Hong-Yun [1 ]
机构
[1] Beijing Univ Technol, Coll Elect & Control Engn, Beijing 100124, Peoples R China
基金
中国国家自然科学基金;
关键词
SiGe HBT; Ge composition; thermal-electric feedback; ballasting resistance; FINGER HBT; MODEL; RUNAWAY;
D O I
10.7498/aps.60.044402
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
As is well known, direct-current (DC) characteristic, frequency characteristic and noise characteristic of SiGe heterojunction bipolar transistor(HBT) can be improved by "bandgap engineering" (by Ge composition). However, the effect of "bandgap engineering" on the thermal characteristic of HBT has not been reported. In this paper, the effect of "bandgap engineering" is analyzed by the use of 3D thermal-electric feedback model. Considering the temperature dependence of emitter junction voltage and current gain, the expression of the minimum emitter ballasting resistance (R-Emin), which is necessary for SiGe HBT thermal stability, is presented. Furthermore, non-uniform ballasting resistance design is given so as to further enhance the thermal stability of device. It is found that the surface temperature of the device decreases with the increase of Ge composition in SiGe base. This is because SiGe HBT internally possesses the thermal-electrical negative feedback. For the same dissipated power, the R-Emin decreases as Ge composition increases, which is beneficial to the improvment of the performance of radio frequancy(RF) power SiGe HBT. These results provide a good guide to further optimization of RF power SiGe HBT performance, especially thermal design.
引用
收藏
页数:6
相关论文
共 18 条
  • [1] A new physics-based self-heating effect model for 4H-SiC MESFETs
    Key Lab., Xidian University, Education Ministry for Wide Band-Gap Semiconductor Materials and Devices, Xían 710071, China
    [J]. Chin. Phys., 2008, 12 (4622-4626):
  • [2] An exploration of substrate coupling at K-band between a SiGe HBT power amplifier and a SiGe HBT voltage-controlled-oscillator
    Comeau, Jonathan P.
    Najafizadeh, Laleh
    Andrews, Joel M.
    Prakash, A. P. Gnana
    Cressler, John D.
    [J]. IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2007, 17 (05) : 349 - 351
  • [3] Electro-luminescence and photo-luminescence from strained SiGe/Si quantum well
    Dong, WF
    Yang, QQ
    Li, J
    Wang, QM
    Chui, QA
    Zhou, JM
    Huang, Q
    [J]. ACTA PHYSICA SINICA-OVERSEAS EDITION, 1996, 5 (06): : 456 - 462
  • [4] THERMAL DESIGN STUDIES OF HIGH-POWER HETEROJUNCTION BIPOLAR-TRANSISTORS
    GAO, GB
    WANG, MZ
    GUI, X
    MORKOC, H
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (05) : 854 - 863
  • [5] THERMAL RUNAWAY TOLERANCE IN DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTORS
    HIDAKA, O
    MORIZUKA, K
    MOCHIZUKI, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (2B): : 886 - 888
  • [6] COMPARISON OF ONE-DIMENSIONAL AND 2-DIMENSIONAL MODELS OF TRANSISTOR THERMAL INSTABILITY
    HOWER, PL
    GOVIL, PK
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (10) : 617 - 623
  • [7] Hu HY, 2005, CHINESE PHYS, V14, P1439, DOI 10.1088/1009-1963/14/7/030
  • [8] UNIFIED APPARENT BANDGAP NARROWING IN NORMAL-TYPE AND PARA-TYPE SILICON
    KLAASSEN, DBM
    SLOTBOOM, JW
    DEGRAAFF, HC
    [J]. SOLID-STATE ELECTRONICS, 1992, 35 (02) : 125 - 129
  • [9] Study of valence intersubband absorption in tensile strained Si/SiGe quantum wells
    Lin Gui-Jiang
    Lai Hong-Kai
    Li Cheng
    Chen Song-Yan
    Yu Jin-Zhong
    [J]. CHINESE PHYSICS B, 2008, 17 (09) : 3479 - 3483
  • [10] ANALYTICAL MODEL FOR THE ALGAAS/GAAS MULTIEMITTER FINGER HBT INCLUDING SELF-HEATING AND THERMAL COUPLING EFFECTS
    LIOU, JJ
    LIOU, LL
    HUANG, CI
    [J]. IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS, 1994, 141 (06): : 469 - 475