Thin Film Optical Elements in Extreme Ultraviolet and Vacuum Ultraviolet

被引：4
|
作者：
Qi Runze [1 ]
Zhang Jinlong [1 ]
Wu Jiali [1 ]
Li Shuangying [1 ]
Huang Qiushi [1 ]
Zhang Zhong [1 ]
Wang Zhanshan [1 ]
机构：
[1] Tongji Univ, Sch Phys Sci & Engn, Inst Precis Opt Engn, Key Lab Adv Microstruct Mat,Minist Educ, Shanghai 200092, Peoples R China
来源：
ACTA OPTICA SINICA | 2022年 / 42卷 / 11期
关键词：
X-ray optics; extreme ultraviolet and vacuum ultraviolet; thin film elements; narrow bandwidth; stability; high reflectivity; RESOLUTION TABLETOP MICROSCOPY; MULTILAYER; COATINGS; OPTIMIZATION; REFLECTIVITY; PERFORMANCE; SC/SI; SPECTROSCOPY; STABILITY; RANGE;
D O I：
10.3788/AOS202242.1134003
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) high-performance thin film optical elements greatly improve the capability of high-precision observation, and contribute to the development of astronomy, materials, physics, and other disciplines. According to the different application requirements as well as physical and chemical properties of materials, the Institute of Precision Optical Engineering (IPOE) in Tongji University has successfully developed amounts of high-performance thin film mirrors, such as Mg/SiC, Sc/Si, Yb/Al, AI -LiF+eMgF(2) and LaF3/MgF2, which can meet the requirements of application in whole EUV and VUV wavelength ranges (25-200 nm). These mirrors are already applied to domestic large-scale scientific instrument (from ground to space). This paper briefly introduces the research progress obtained by IPOE during the development of EUV and VUV thin film optical elements.
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页数：11
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共 84 条
  • [1] The correlation between coronal Doppler shifts and the supergranular network
    Aiouaz, T
    Peter, H
    Lemaire, P
    [J]. ASTRONOMY & ASTROPHYSICS, 2005, 435 (02): : 713 - 721
  • [2] Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers
    Bajt, S
    Stearns, DG
    Kearney, PA
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (02) : 1017 - 1025
  • [3] Barstow M., 2003, EXTREME ULTRAVIOLET
  • [4] BAUER M, 2005, J JOURNALOF PHYS APP, V38, P253
  • [5] BowyerS DrakeJ J, 2000, ANNU REV ASTRON ASTR, V38, P231
  • [6] PREPARATION OF MIRROR COATINGS FOR VACUUM ULTRAVIOLET IN A 2-M EVAPORATOR
    BRADFORD, AP
    HASS, G
    OSANTOWSKI, JF
    TOFT, AR
    [J]. APPLIED OPTICS, 1969, 8 (06) : 1183 - +
  • [7] BuenoJ T, 2012, ASTROPHYSICALJOURNAL, V746, pL9
  • [8] CanfieldL R, 1966, J APPL OPT, V5, P45
  • [9] Cunningham N. J., 2004, Proceedings of the SPIE - The International Society for Optical Engineering, V5166, P296, DOI 10.1117/12.504628
  • [10] EUV SPECTROSCOPY AS A PLASMA DIAGNOSTIC
    DWIVEDI, BN
    [J]. SPACE SCIENCE REVIEWS, 1993, 65 (3-4) : 289 - 316
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