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- [6] An Improved Lightweight YOLOv5 Model Based on Attention Mechanism for Face Mask Detection ARTIFICIAL NEURAL NETWORKS AND MACHINE LEARNING - ICANN 2022, PT III, 2022, 13531 : 531 - 543
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- [9] CAD Fabric Model Defect Detection Based on Improved Yolov5 Based on Self-Attention Mechanism Computer-Aided Design and Applications, 2024, 21 (S6): : 63 - 71
- [10] A Cross-Domain Recommendation Model Based on Dual Attention Mechanism and Transfer Learning Yun, Wu-Lian (yunwulll@163.com); Wang, Li-Ming (ielmwang@zzu.edu.cn), 1924, Science Press (43): : 1924 - 1942