Dynamic electron microscopy of semiconductor nanowire and quantum dot growth

被引:0
|
作者
Ross, Frances M. [1 ]
机构
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
group IV semiconductor epitaxy; quantum dots; nanowires; in situ electron microscopy;
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We discuss the use of dynamic electron microscopy to visualise, in real time, the epitaxial growth of Si and Ge nanostructures. In situ observations of the formation of quantum dots and nanowires provide real time kinetic information that can be useful in determining the physical processes that control nanostructure growth. By comparing observations made during growth with observations of the same structures made after cooling and air exposure, we demonstrate the uniqueness of the information that can be acquired from dynamic microscopy during growth.
引用
收藏
页码:363 / 376
页数:14
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