Simulation-based systematic error compensation for nanoprofiler using normal vector tracing method

被引：7

作者：

Kudo, Ryota ^{[1
]}

Okita, Kenya ^{[2
]}

Okuda, Kohei ^{[2
]}

Tokuta, Yusuke ^{[2
]}

Nakano, Motohiro ^{[2
]}

Yamamura, Kazuya ^{[1
]}

Endo, Katsuyoshi ^{[1
]}

机构：

[1] Osaka Univ, Res Ctr Ultraprecis Sci & Technol, Suita, Osaka 5650871, Japan

[2] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan

来源：

MEASUREMENT | 2015年 / 73卷

关键词：

Nanoprofiler; Normal vector; Aspherical surface; Free-form; High-precision mirror; Calibration;

D O I：

10.1016/j.measurement.2015.05.047

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed a nanoprofiler that relies on the use of the normal vector. Our aim was to enable the measurement of the profile of free-form surfaces with high precision. Since the nanoprofiler does not use a reference surface, it should be capable of measuring free-form surfaces with a high degree of accuracy. Repeatability at the sub-nanometer level has been achieved. In this study, with a goal of reducing and evaluating the related uncertainty, we set out to estimate the degree of systematic error. We investigated the effect of the systematic error on the measurement results by computer simulation. Then, by comparing the measured results with those of the simulation, we estimated the systematic error. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：473 / 479

页数：7

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