Design of high-efficiency diffraction gratings based on rigorous coupled-wave analysis for 800nm wavelength

被引:2
|
作者
Wei-Jin, Kong [1 ]
Mao-Jin, Yun [1 ]
Shi-Jie, Liu [2 ]
Yun-Xia, Jin [2 ]
Zheng-Xiu, Fan [2 ]
Jian-Da, Shao [2 ]
机构
[1] Qingdao Univ, Coll Phys Sci, Qingdao 266071, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
关键词
D O I
10.1088/0256-307X/25/5/044
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 800 nm. The optimized grating can achieve > 95% diffraction efficiency in the first order at an incident angle of 5 degrees from Littrow and a wavelength from 770nm to 830 nm, with peak diffraction efficiency of > 99.5% at 800 nm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-efficiency, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti:sapphire laser systems.
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页码:1684 / 1686
页数:3
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