Adsorption of hydrogen on tantalum in the temperature range 77-373 K

被引：0
|
作者：
Bratchikova, IG [1 ]
Mikhalenko, II [1 ]
Sapata, OL [1 ]
Yagodovskii, VD [1 ]
机构：
[1] Russian Univ Peoples Friendship, Moscow 117198, Russia
来源：
RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY | 2001年 / 75卷 / 05期
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Isotherms of H-2 adsorption on a Ta foil were measured over the temperature range 77-373 K at pressures of 0.06-2.0 Pa. Induced- and activated-adsorption modes were revealed. The adsorption isotherms exhibited a maximum near 300 K. Experimental results were treated using a model adsorption isotherm for surfaces with induced nonuniformity. The shape of the isotherms was described by changes in the character of interaction between the adsorbate and the surface electron density of the metal.
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页码：818 / 822
页数：5
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