Anomalous current leakage and depletion width control in nanometer scale Schottky gates formed on AlGaAs/GaAs surface

被引:0
|
作者
Jia, R [1 ]
Kasai, S
Hasegawa, H
机构
[1] Hokkaido Univ, Res Ctr Integrated Quantum Elect, Sapporo, Hokkaido 060, Japan
[2] Hokkaido Univ, Grad Sch Informat Sci & Technol, Sapporo, Hokkaido 060, Japan
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Investigation of gate control and current-voltage (I-V) characteristics of nanometer scale Schottky electrodes is in an attempt to clarify the possible effects of surface states. HEMT devices having nanometer-sized Schottky gate showed a gate controllability so that the effective gate length was extended, as well as Schottky gate's anomalous I-V characteristics different from the prediction of thermionic emission theory. QWRTrs having an additional side gate exhibited large side-gating effect that was much larger than that by side gate depletion with anomalous side gate leakage current. The origin of obtained gate control anomalies is understood by the high-density surface state charging in gate peripheries that produces strong electric field and induces excess surface state charging by carrier injection from the gate.
引用
收藏
页码:21 / 26
页数:6
相关论文
共 15 条
  • [1] Effects of surface fermi level pinning and surface state charging on control characteristics of nanometer scale Schottky gates formed on GaAs
    Kameda, A
    Kasai, S
    Sato, T
    Hasegawa, H
    2001 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, PROCEEDINGS, 2001, : 626 - 629
  • [2] Effects of surface states on control characteristics of nano-meter scale Schottky gates formed on GaAs
    Kameda, A
    Kasai, S
    Sato, T
    Hasegawa, H
    SOLID-STATE ELECTRONICS, 2003, 47 (02) : 323 - 331
  • [3] VARIABLE WIDTH AND ELECTRON-DENSITY QUANTUM WIRES IN GAAS/ALGAAS WITH ION-IMPLANTED GATES AND A SURFACE SCHOTTKY GATE
    BLAIKIE, RJ
    CLEAVER, JRA
    AHMED, H
    NAKAZATO, K
    APPLIED PHYSICS LETTERS, 1992, 60 (13) : 1618 - 1620
  • [4] Gate control, surface leakage currents, and peripheral charging in AlGaN/GaN heterostructure field effect transistors having nanometer-scale Schottky gates
    Kasai, S
    Kotani, J
    Hashizume, T
    Hasegawa, H
    JOURNAL OF ELECTRONIC MATERIALS, 2006, 35 (04) : 568 - 575
  • [5] Gate control, surface leakage currents, and peripheral charging in AlGaN/GaN heterostructure field effect transistors having nanometer-scale schottky gates
    S. Kasai
    J. Kotani
    T. Hashizume
    H. Hasegawa
    Journal of Electronic Materials, 2006, 35 : 568 - 575
  • [6] Effect of surface treatment on leakage current of GaAs/AlGaAs laser microcavities
    Kim, JY
    Lee, J
    Kim, J
    Kang, BK
    Kwon, O
    APPLIED PHYSICS LETTERS, 2003, 82 (25) : 4504 - 4506
  • [7] Gate control characteristics in GaAs nanometer-scale Schottky wrap gate structures
    Yumoto, M
    Kasai, S
    Hasegawa, H
    APPLIED SURFACE SCIENCE, 2002, 190 (1-4) : 242 - 246
  • [8] Simultaneous control of subthreshold and gate leakage current in nanometer-scale CMOS circuits
    Shin, Youngsoo
    Heo, Sewan
    Kim, Hyung-Ock
    Choi, Jung Yun
    PROCEEDINGS OF THE ASP-DAC 2007, 2007, : 654 - +
  • [9] Reduction of Schottky reverse leakage current using GaAs surface cleaning with UVO3 treatment
    Tanimoto, Takuma
    Ohbu, Isao
    Ohta, Hiroshi
    Takatani, Shinichiro
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (7 A): : 3982 - 3985
  • [10] Reduction of Schottky reverse leakage current using GaAs surface cleaning with UVO3 treatment
    Tanimoto, T
    Ohbu, I
    Ohta, H
    Takatani, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (7A): : 3982 - 3985