Femtosecond laser color marking of metal and semiconductor surfaces

被引：72

作者：

Ionin, Andrey A. ^{[1
]}

Kudryashov, Sergey I. ^{[1
]}

Makarov, Sergey V. ^{[1
]}

Seleznev, Leonid V. ^{[1
]}

Sinitsyn, Dmitry V. ^{[1
]}

Golosov, Evgeniy V. ^{[2
]}

Golosova, Ol'ga A. ^{[2
]}

Kolobov, Yuriy R. ^{[2
]}

Ligachev, Alexander E. ^{[3
]}

机构：

[1] Russian Acad Sci, PN Lebedev Phys Inst, Moscow 119991, Russia

[2] Belgorod State Univ, Belgorod 308015, Russia

[3] Russian Acad Sci, AM Prokhorov Gen Phys Inst, Moscow 119991, Russia

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2012年 / 107卷 / 02期

基金：

俄罗斯基础研究基金会;

关键词：

SILICON; ABSORPTION; EFFICIENCY; PULSES;

D O I：

10.1007/s00339-012-6849-y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Color marking of rough or smooth metal (Al, Cu, Ti) and semiconductor (Si) surfaces was realized via femtosecond laser fabrication of periodic surface nanorelief, representing one-dimensional diffraction gratings. Bright colors of the surface nanorelief, especially for longer electromagnetic wavelengths, were provided during marking through pre-determined variation of the laser incidence angle and the resulting change of the diffraction grating period. This coloration technique was demonstrated for the case of silicon and various metals to mark surfaces in any individual color with a controllable brightness level and almost without their accompanying chemical surface modification.

引用

页码：301 / 305

页数：5

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