Study of amorphous Zinc Germanium Nitride thin films grown by reactive co-sputtering

被引:5
|
作者
Beddelem, Nicole [1 ,2 ]
Rochat, Nevine [3 ,4 ]
Licitra, Christophe [3 ,4 ]
Hyot, Berangere [3 ,4 ]
Miska, Patrice [1 ]
机构
[1] Univ Lorraine, CNRS, Inst Jean Lamour, Campus ARTEM,2 Allee Andre Guinier,BP 50840, F-54011 Nancy, France
[2] CEA Tech Grand Est, 5 Rue Marconi, F-57075 Metz, France
[3] Univ Grenoble Alpes, F-38000 Grenoble, France
[4] CEA, LETI, MINATEC Campus, F-38000 Grenoble, France
关键词
Amorphous semiconductors; Sputtering; Thin films; Optical properties; ASSISTED DEPOSITION; ZNGEN2; GAN;
D O I
10.1016/j.jnoncrysol.2017.12.025
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Under its crystalline form, the ZnGeN2 alloy is promising for optoelectronic devices such as LEDs because of its large, direct and adjustable band gap. Nevertheless, data are scarce, more especially for the amorphous form. We report here on the study of zinc germanium nitride amorphous thin films obtained by reactive co-sputtering. The samples are elaborated by PVD and analyzed by physical and chemical methods to determine their composition, structure and optical properties. We observe a clear evolution of these properties with composition. The shape of the complex refractive index reveals changes in the electronic structure. Furthermore, the optical gap and Urbach energy decrease with increasing zinc content.
引用
收藏
页码:132 / 136
页数:5
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