Variable reflectivity unstable resonators for a long pulse XeCl excimer laser

被引：5
|
作者：
Hofstra, RM
Zwegers, MJ
van Goor, FA
Witteman, WJ
机构：
[1] Univ Twente, NL-7500 AE Enschede, Netherlands
[2] Nederlands Centrum Laser Res, NL-7500 CR Enschede, Netherlands
来源：
OPTICS COMMUNICATIONS | 1998年 / 150卷 / 1-6期
关键词：
D O I：
10.1016/S0030-4018(98)00111-4
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The divergence of a long pulse, low gain XeCl excimer laser has been improved using confocal positive branch unstable resonators with variable reflectivity mirrors as outcouplers. With variable reflectivity unstable resonators, nearly diffraction limited beams are obtained. Variable reflectivity resonators lead to high brightness beams (9.1 x 10(14) W/(cm(2) sr)). Different reflection profiles were studied with respect to their influence on the beam quality and the energy extraction. (C) 1998 Elsevier Science B,V. All rights reserved.
引用
收藏
页码：163 / 169
页数：7
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