A new drain current model for amorphous IGZO thin film transistors

被引:3
|
作者
Qiang, Lei [1 ]
Yao, Ruo-He [1 ]
机构
[1] S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
来源
基金
中国国家自然科学基金;
关键词
FIELD-EFFECT TRANSISTORS; OXIDE SEMICONDUCTOR; SILICON; TRANSPORT; VOLTAGE; TAIL; TFTS;
D O I
10.1051/epjap/2015150032
中图分类号
O59 [应用物理学];
学科分类号
摘要
Based on the conduction mechanisms of amorphous InGaZnO (a-IGZO) thin film transistors, generalized equations are derived which permit the determination of drain current characteristics. A geometry-independent definition for field effect mobility considering the ratio of free-to-trapped carriers is introduced, which conveys the properties of the active semiconducting layer. It is suggested that a drain current model that includes different charge transports gives a consistent and accurate description of the electrical behavior. The good agreement between measured and calculated results confirms the efficiency of this model for the design of integrated large-area thin-film circuits.
引用
收藏
页数:4
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