Depositing nanoparticles on a silicon substrate using a freeze drying technique

被引:4
|
作者
Sigehuzi, Tomoo [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Res Inst Measurement & Analyt Instrumentat, Tsukuba, Ibaraki 3058568, Japan
来源
JOURNAL OF CHEMICAL PHYSICS | 2017年 / 147卷 / 08期
关键词
D O I
10.1063/1.4998183
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
For the microscopic observation of nanoparticles, an adequate sample preparation is an essential part of this task. Much research has been performed for usable preparation methods that will yield aggregate-free samples. A freeze drying technique, which only requires a -80 degrees C freezer and a freeze dryer, is shown to provide an on-substrate dispersion of mostly isolated nanoparticles. The particle density could be made sufficiently high for efficient observations using atomic force microscopy. Since this sandwich method is purely physical, it could be applied to deposit various nanoparticles independent of their surface chemical properties. Suspension film thickness, or the dimensionality of the suspension film, was shown to be crucial for the isolation of the particles. Silica nanoparticles were dispersed on a silicon substrate using this method and the sample properties were examined using atomic force microscopy. Published by AIP Publishing.
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页数:5
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