Advanced devices using low-temperature NiSi formation

被引：0
|
作者：
Murakami, T [1 ]
Carron, V
Yoo, WS
机构：
[1] WaferMasters Serv Factory, Kumamoto, Japan
[2] CEA, GRE, DTS, LETI,DRT, Grenoble, France
[3] WaferMasters Inc, San Jose, CA USA
来源：
SOLID STATE TECHNOLOGY | 2003年 / 46卷 / 09期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：32 / +
页数：2
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