EB stepper-A high throughput electron-beam projection lithography system

被引：5
|
作者：
Yamaguchi, T [1 ]
机构：
[1] Nikon Inc, IC Equipment Div, Dev Dept 2, Shinagawa Ku, Tokyo 1408601, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2000年 / 39卷 / 12B期
关键词：
next-generation lithography (NGL); electron projection lithography (EPL); electron beam (EB); projection reduction exposure with variable axis immersion lens (PREVAIL); curvilinear variable axis lens (CVAL); scattering contrast;
D O I：
10.1143/JJAP.39.6897
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The development program of an electron-beam (EB) stepper is under way based on the results of proof of the concept system. Very careful system consideration has been made, because some critical issues have not yet been proven. However, they could be well managed by implementing a new methodology that is introduced by examining each issue from the viewpoint of the basic electron optics principle. In this paper, the practicability and extendability of an EB stepper are discussed and overviewed.
引用
收藏
页码：6897 / 6901
页数：5
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