Digital growth of thick N-polar InGaN films on relaxed InGaN pseudosubstrates

被引：15

作者：

Lund, Cory ^{[1
]}

Hestroffer, Karine ^{[1
]}

Hatui, Nirupam ^{[1
]}

Nakamura, Shuji ^{[2
]}

DenBaars, Steven P. ^{[1
,2
]}

Mishra, Umesh K. ^{[1
]}

Keller, Stacia ^{[1
]}

机构：

[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

[2] Univ Calif Santa Barbara, Mat Dept, Santa Barbara, CA 93106 USA

来源：

APPLIED PHYSICS EXPRESS | 2017年 / 10卷 / 11期

关键词：

INDIUM INCORPORATION; HETEROSTRUCTURES; DEFECTS; LAYERS; GREEN; FACE;

D O I：

10.7567/APEX.10.111001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Smooth relaxed N-polar InGaN films were grown by metal-organic CVD (MOCVD) on N-polar InGaN pseudosubstrates ( PSs) using a novel digital approach consisting of a constant In precursor flow with the pulsed injection of H-2 carrier gas. InGaN layers grown on PSs exhibited an In composition of about 50% higher than those of the layers grown on N-polar GaN templates, assuming the in-plane lattice constant of the relaxed PSs, corresponding to In0.11Ga0.89N. Additionally, the luminescence recorded from InGaN layers grown on PSs at 490nm was twice as intense as that obtained from the layers deposited on coloaded GaN-on-sapphire templates, which emitted at 430 nm. (C) 2017 The Japan Society of Applied Physics

引用

页数：4

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