High-resolution neutron scattering with commercial thin silicon wafers as focusing monochromators

被引:6
|
作者
Popovici, M [1 ]
Herwig, KW
Berliner, R
Yelon, WB
Groza, L
机构
[1] Univ Missouri, Res Reactor, Columbia, MO 65211 USA
[2] Univ Missouri, Dept Nucl Engn, Columbia, MO 65211 USA
来源
PHYSICA B | 1997年 / 241卷
关键词
quasielastic neutron scattering; three-axis spectrometer; bent silicon wafers;
D O I
10.1016/S0921-4526(97)00555-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Quasielastic scattering measurements with commercial silicon wafers as focusing monochromator and analyzer in a three-axis spectrometer showed energy-transfer resolutions in the 10-100 mu eV range (fwhm). Resolutions were better and intensities higher than in a conventional arrangement with Seller collimators and pyrolytic graphite (PG) monochromator and analyzer. Resolution remained high when extended-plate samples were used in focusing orientation. At cold sources, this technique would give 10-20 mu eV resolutions at neutron energies near the peak of the spectrum. Projections of resolution ellipsoids were determined by diffraction from powder samples. The orientations of the ellipsoids are controlled by horizontal curvatures and can be rotated 90 degrees for high Q-resolution. A monochromator unit with remote control of horizontal curvature and fixed vertical curvature set to spatial focusing at the sample position was also tested. The strong vertical focusing gave a significant gain in integrated intensities, but worsened the resolution because of second-order aberrations. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:216 / 218
页数:3
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