The effect of thickness and arc current on the structural properties of FCVA synthesised ta-C and ta-C:N films

Two sets of experiments were carried out for both ta-C and ta-C:N films prepared by filtered cathodic vacuum arc deposition (FCVA). For the first experiment films were prepared as a function of arc current ranging from 30 to 100 A with a film thickness of approximately 70 nm. In the second experiment a series of films was prepared as a function of thickness ranging from 30 to 100 run at 80 A arc current. Raman studies showed that for ta-C and ta-C:N films, an arc current of 100 A produced films with the lowest sp(2) configurations as well as the highest density values. The effect of thickness on ta-C and ta-C:N films revealed different trends. Raman and XRR analysis identified a decrease in sp(2) content and an increase in density as film thickness was increased for ta-C films. However ta-C:N films exceeding 70 nm showed an increasing trend in sp(2) content whilst a significant drop in density was observed. (c) 2005 Published by Elsevier B.V.