Comparative analysis of direct laser writing and nanoimprint lithography for fabrication of optical phase elements

被引:13
|
作者
Lightman, Shlomi [1 ,2 ]
Gvishi, Raz [1 ]
Hurvitz, Gilad [1 ]
Arie, Ady [2 ]
机构
[1] Soreq NRC, Div Appl Phys, IL-81800 Yavne, Israel
[2] Tel Aviv Univ, Sch Elect Engn, IL-69978 Tel Aviv, Israel
关键词
WAVE-GUIDES;
D O I
10.1364/AO.55.009724
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report a comparison between two commercially available methods for printing phase shaping optical microstructures. Phase elements that convert a zero-order Hermite-Gaussian (HG(00)) mode into higher-order modes (HG(10), HG(01), HG(20), and HG(02)) were fabricated by 3D-direct laser writing (3D-DLW) and nanoimprint lithography (NIL). The structures in each method were characterized and the corresponding beam qualities were analyzed. The direct comparison of equivalent optical devices enables us to reveal the limitations and advantages of the two fabrication methods in order to optimize the fabrication of useful optical microstructure devices. 3D-DLW enables sharper edges and a straightforward lithography process, while NIL enables fabrication of thinner elements, and allows using a larger variety of optical materials including sol-gel glasses, which possess better surface optical quality. (C) 2016 Optical Society of America
引用
收藏
页码:9724 / 9730
页数:7
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