Epitaxial growth of Bi2Se3 in the (0015) orientation on GaAs (001)

被引:7
|
作者
Ginley, Theresa P. [1 ]
Zhang, Yuying [1 ]
Ni, Chaoying [1 ]
Law, Stephanie [1 ]
机构
[1] Univ Delaware, Dept Mat Sci & Engn, 201 DuPont Hall,127 Green, Newark, DE 19716 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2020年 / 38卷 / 02期
基金
美国国家科学基金会;
关键词
Bismuth compounds - Gallium arsenide - Morphology - Van der Waals forces - III-V semiconductors - Epitaxial growth - Films - Semiconducting gallium - Selenium compounds - Optoelectronic devices;
D O I
10.1116/1.5139905
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Materials with van der Waals bonding show exotic physics and may have applications in a variety of areas including new optoelectronic devices, spintronic devices, and as quantum materials. To date, control over the morphology and surface orientation of thin films of these materials without substrate pretreatment has been difficult. In this paper, the authors report the growth of Bi2Se3 on GaAs (001) substrates. By controlling the growth conditions and adatom mobility, the authors are able to obtain epitaxial growth in the (0015) orientation without substrate prepatterning. Although the growth window is small, this demonstration opens the door for future control of the orientation of van der Waals materials through control of parameters during growth and via interaction with the substrate.
引用
收藏
页数:7
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