Analyzing available alternatives for point-of-use abatement

The continually growing array of materials used in deposition and other wafer processing applications requires continuous evaluation of exhaust abatement methods. In addition, newer point-of-use methods of abatement may provide opportunities for cost savings. In any case, however, performance characterization of an abatement unit is an important activity for both existing and emerging processes to ensure there is no negative,impact to abatement performance.