The microstructure, surface morphology, and dielectric properties of Ba0.5Sr0.5TiO3 (BST) thin films prepared by radio-frequency magnetron sputtering at substrate temperatures ranging from 350 to 750 degrees C were characterized. The film deposited at substrate temperature 350 degrees C is amorphous, whereas those deposited at substrate temperatures between 450 and 650 degrees C are a mixture of crystalline and amorphous phases. The amount of crystalline phases increases with the substrate temperature. The phase transformation from amorphous to crystalline occurs at 450 degrees C and the amorphous phase transformed completely into crystalline phase at 750 degrees C. Furthermore, the film deposited at substrate temperature 750 degrees C shows a typical columnar structure with an average size of 100 nm in width extending across the entire film thickness. Dielectric constant of the BST films increases with the substrate temperature due to an increase of the crystalline phases at higher substrate temperature, and reaches a maximum value of 90 at substrate temperature 750 degrees C. Nevertheless, it is also observed that the leakage current of the BST films increases with the content of the crystalline phase. (c) 2005 The Electrochemical Society. All rights reserved.
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Jozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Jozef Stefan Int Postgrad Sch, Jamova Cesta 39, SI-1000 Ljubljana, SloveniaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Pecnik, Tanja
Erste, Andreja
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Jozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Jozef Stefan Int Postgrad Sch, Jamova Cesta 39, SI-1000 Ljubljana, SloveniaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Erste, Andreja
Matavz, Aleksander
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Jozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Jozef Stefan Int Postgrad Sch, Jamova Cesta 39, SI-1000 Ljubljana, SloveniaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Matavz, Aleksander
Bobnar, Vid
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Jozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Jozef Stefan Int Postgrad Sch, Jamova Cesta 39, SI-1000 Ljubljana, SloveniaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Bobnar, Vid
Ivanov, Maksim
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Vilnius Univ, Fac Phys, LT-10222 Vilnius, LithuaniaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Ivanov, Maksim
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Banys, Juras
Xiang, Feng
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Xi An Jiao Tong Univ, Sch Elect & Informat Engn, 28 XianNing West, Xian 710049, Peoples R ChinaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Xiang, Feng
Wang, Hong
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Xi An Jiao Tong Univ, Sch Elect & Informat Engn, 28 XianNing West, Xian 710049, Peoples R ChinaJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Wang, Hong
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Malic, Barbara
Glinsek, Sebastjan
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Jozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
CEA Grenoble, LETI, Minatec Campus,17 Rue Martyrs, F-38054 Grenoble, France
IPDiA, 2 Rue Girafe, F-14000 Caen, FranceJozef Stefan Inst, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, ID
Park, JH
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Park, JH
Kim, HG
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea