In-situ monitoring of crystal growth in LPE using microprocessor

被引:1
|
作者
Patel, SA [1 ]
Chaudhari, CB [1 ]
Gautam, DK [1 ]
机构
[1] N Maharashtra Univ, Dept Elect, Instrumentat Div, Jalgaon 425001, India
关键词
D O I
10.1080/02564602.1998.11416724
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
LPE is the simplest technique for the growth of epitaxial layer. In this paper, we deal with the automation of LPE system through which the quantum well layers can be very precisely grown. The electronic hardware has been developed and is linked with the conventional LPE system. Software flowchart which deals with the various actions taken during the growth process has also been mentioned. Three different methods considered here are step, super, and equilibrium cooling. Our developed system demands only the layer thickness and other supporting parameters for the autocontrol. The cooling rate and the growth time are simultaneously and independently controlled. smooth layers in the wide range from nanometer to micron can be grown by using our LPE system. Because of this economic hardware linked with LPE system, it should have considerable practical importance in growth technology to fabricate the devices like quantum well lasers, modulators and switches.
引用
收藏
页码:21 / 26
页数:6
相关论文
共 50 条
  • [1] In-situ crystal growth monitoring using a CCD imaging system
    Sghaier, H
    Bouzaiene, L
    Sfaxi, L
    Maud, H
    SENSORS AND ACTUATORS A-PHYSICAL, 2005, 121 (01) : 95 - 102
  • [2] In-Situ Monitoring of Paraffin Wax Crystal Formation and Growth
    Haj-Shafiei, Samira
    Workman, Ben
    Trifkovic, Milana
    Mehrotra, Anil K.
    CRYSTAL GROWTH & DESIGN, 2019, 19 (05) : 2830 - 2837
  • [3] IN-SITU MONITORING TECHNIQUE FOR GROWTH OF CdS LAYER BY QUARTZ CRYSTAL MICROBALANCE
    Yun, JaeHo
    Ahn, SeJin
    Lee, JeongChul
    Yoon, KyungHoon
    PVSC: 2008 33RD IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, VOLS 1-4, 2008, : 810 - 811
  • [4] IN-SITU MONITORING AND CONTROL OF MOCVD GROWTH USING MULTIWAVELENGTH ELLIPSOMETRY
    PITTAL, S
    JOHS, B
    HE, P
    WOOLLAM, JA
    MURTHY, SD
    BHAT, IB
    COMPOUND SEMICONDUCTORS 1994, 1995, (141): : 41 - 44
  • [5] In-situ observation of crystal growth and the mechanism
    Tsukamoto, Katsuo
    PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 2016, 62 (02) : 111 - 125
  • [6] In-situ monitoring of biological growth on stone
    Brechet, E
    McStay, D
    Wakefield, RD
    Sweet, M
    Jones, MS
    ADVANCED TECHNOLOGIES FOR ENVIRONMENTAL MONITORING AND REMEDIATION, 1996, 2835 : 30 - 35
  • [7] Large-area growth of InGaN/AlGaN using in-situ monitoring
    Woelk, E
    Schmitz, D
    Strauch, G
    Wachtendorf, B
    Juergensen, H
    III-V NITRIDES, 1997, 449 : 265 - 269
  • [8] Laser and Mach-Zehnder interferometry for in-situ monitoring of crystal growth and concentration variation
    Kim, Y
    Reddy, BR
    Lal, RB
    LASER INTERFEROMETRY IX: APPLICATIONS, 1998, 3479 : 172 - 180
  • [9] In-situ monitoring of AlN crystal growth on 6H-SiC by the use of a pyrometer
    Suzuki, T
    Inushima, T
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 1565 - 1568
  • [10] IN-SITU MONITORING OF PHOSPHATATION REACTIONS ON ZN USING THE QUARTZ-CRYSTAL MICROBALANCE
    OGLE, KM
    GABRIELLI, C
    KEDDAM, M
    PERROT, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (10) : 2655 - 2658