Field electron emission from two-dimensional electron gas

被引:7
|
作者
Filip, V
Nicolaescu, D
Wong, H
Nagao, M
Chu, PL
机构
[1] AIST, Nanoelect Res Inst, Tsukuba, Ibaraki 3058568, Japan
[2] City Univ Hong Kong, Dept Elect Engn, Kowloon, Hong Kong, Peoples R China
[3] City Univ Hong Kong, Optoelect Res Ctr, Kowloon, Hong Kong, Peoples R China
来源
关键词
D O I
10.1116/1.1886820
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The article presents a quantum mechanical model for the electron field emission from semiconductor surfaces covered by dielectric layers. By systematically connecting electronic wave functions at. various interfaces, the model obtains in a unified manner the field emission current density from both clean and dielectric-covered semiconductor substrates. No energy quantization is imposed for the interface layer and thermodynamic nonequilibrium is allowed between the conduction electrons from the interface (accumulation) layer and those of the bulk. The model is applied to study the electron field emission from Si tips covered by ultrathin oxide layers, and also to explain the resonance effects observed in field emission from Si covered by thicker dielectric layers. (c) 2005 American Vacuum Society.
引用
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页码:657 / 664
页数:8
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