STM-induced desorption of hydrogen from a silicon surface: An open-system density matrix study

被引:34
|
作者
Boendgen, G [1 ]
Saalfrank, P [1 ]
机构
[1] Free Univ Berlin, Inst Phys & Theoret Chem, D-14195 Berlin, Germany
来源
JOURNAL OF PHYSICAL CHEMISTRY B | 1998年 / 102卷 / 41期
关键词
D O I
10.1021/jp9823695
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The dynamics of the scanning tunneling microscope (STM)-induced desorption of hydrogen atoms from Si(100)-(2 x 1):H (D) surfaces in the "above electronic threshold limit", which is believed to proceed via a short-lived sigma --> sigma* resonance, is investigated theoretically. We use both time-dependent wave packet and density matrix methods and compare them to classical mechanics. Isotope effects in the desorption yields and desorbate translational energies, the role of coordinate-dependent electronic relaxation, and finally the dependence of the observables on the surface temperature T-s are addressed. In agreement with experiment we find no significant dependence of the isotope effect in the desorption yield up to T-s approximate to 300 K. However, for higher T-s a substantial decrease of the ratio between H and D yield is predicted.
引用
收藏
页码:8029 / 8035
页数:7
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