Fabrication of elastomeric stamps with polymer-reinforced sidewalls via chemically selective vapor deposition polymerization of poly(p-xylylene)

被引：28

作者：

Suh, KY

Langer, R ^{[1
]}

Lahann, J

机构：

[1] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

[2] Univ Michigan, Dept Chem Engn, Ann Arbor, MI 48109 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 20期

关键词：

D O I：

10.1063/1.1628392

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the preparation of polydimethylsiloxane stamps with selectively grown polymer sidewalls by chemical vapor deposition polymerization of poly(p-xylylene). Using a thin iron layer as an inhibitor, the deposition occurs only on the sidewalls of the features in relief, resulting in a polymer-reinforced stamp. The wetting properties of stamps can be restored after removing the thin iron layer with an acidic solution, which has been verified by pattern transfer to an underlying substrate using molding and microcontact printing. (C) 2003 American Institute of Physics.

引用

页码：4250 / 4252

页数：3

共 32 条

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