Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures

被引：3

作者：

Lawton, RA ^{[1
]}

Lin, G ^{[1
]}

Wellman, J ^{[1
]}

Phinney, LM ^{[1
]}

Uribe, J ^{[1
]}

Griffith, E ^{[1
]}

De Wolf, I ^{[1
]}

Lawrence, E ^{[1
]}

机构：

[1] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA

来源：

MEMS RELIABILITY FOR CRITICAL APPLICATIONS | 2000年 / 4180卷

关键词：

MEMS reliability; MEMS visualization; process validation;

D O I：

10.1117/12.395698

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Micro-Nano Technology Visualization (MNTV) is critical to studies in MEMS reliability. The ability to see and characterize the microstructures and interfaces with high resolution at the microscale and nanoscale is invaluable. In this paper we present the motivation, paradigm, and examples of visualization techniques applied to several aspects of surface micromachined polysilicon structures. High resolution cross-section imaging, using both a FIB/SEM and FIB/STEM is used to acquire information on profile differences between fabrication facilities and grain size and orientation. The AFM is used to compare surface roughness of both sides (top and bottom surfaces) of thin film polysilicon after release etching. The data gathered will be extremely useful feedback for fabrication facilities in terms of process characterization and quality assurance. The data will also be useful for MEMS CAD tools where device and process models must validated.

引用

页码：96 / 105

页数：10

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