Large tunneling magnetoresistance (>70%) in GaMnAs/AlAs/GaMnAs single-barrier ferromagnetic semiconductor tunnel junctions

被引:4
|
作者
Higo, Y [1 ]
Shimizu, H [1 ]
Tanaka, M [1 ]
机构
[1] Univ Tokyo, Dept Elect Engn, Bunkyo Ku, Tokyo 1138656, Japan
来源
PHYSICA E | 2001年 / 10卷 / 1-3期
基金
日本科学技术振兴机构;
关键词
tunneling magnetoresistance; GaMnAs; ferromagnet; semiconductor; magnetic tunnel junction;
D O I
10.1016/S1386-9477(01)00102-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have observed very large tunneling magneto-resistance (TMR) in GaMnAs/AlAs/GaMnAs single-barrier ferromagnetic semiconductor tunnel junctions grown on a (0 0 1) GaAs substrate by low-temperature molecular beam cpitaxy. The TMR ratio of 72% was obtained in a junction with a thin (1.6 nm) AlAs tunnel barrier when the magnetic field was applied along the [1 0 0] axis in the film plane. The TMR ratio was larger when the applied magnetic field direction was along [1 0 0], compared with other directions of [1 1 0] and [1 1 0]. Also, the TMR ratio was found to decrease with increasing the AlAs barrier thickness. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:292 / 294
页数:3
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